High power impulse magnetron sputtering discharge

Energy flux measurements in high power impulse magnetron sputtering

The total energy flux in a high power impulse magnetron sputtering (HiPIMS) plasma has been measured using thermal probes. Radial flux (parallel to the magnetron surface) as well as axial flux (perpendicular to the magnetron surface) were measured at different positions, and resulting energy flux profiles for the region between the magnetron and the substrate are presented. It was found that th...

On the electron energy in the high power impulse magnetron sputtering discharge

Are the argon metastables important in high power impulse magnetron sputtering discharges?

Time and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N2 atmospheres

Mass spectroscopy was used to analyze the energy and composition of the ion flux during high power pulsed magnetron sputtering (HIPIMS/HPPMS) of a Cr target in an industrial deposition system. The ion energy distribution functions were recorded in the time-averaged and time-resolved mode for Ar + , Ar 2+ , Cr + , Cr 2+ , N2 + and N + ions. In the metallic mode the dependence on pulse energy (eq...

Understanding deposition rate loss in high power impulse magnetron sputtering

The lower deposition rate for high power impulse magnetron sputtering (HiPIMS) compared to direct current magnetron sputtering for the same average power is often reported as a drawback. The often invoked reason is back-attraction of ionized sputtered material to the target, due to a substantial negative potential profile from the location of ionization towards the cathode. Emitting and swept L...